This inventor holds 1 USPTO granted patent. Top assignee: The Hong Kong Polytechnic University. Active years: 1999.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1999
Title: Qing-Hua Fan: Innovator in Chiral Phosphines
Introduction
Qing-Hua Fan is a prominent inventor based in Hong Kong, CN. He has made significant contributions to the field of chemistry, particularly in the development of novel soluble polyester-supported chiral phosphines. His work has implications for catalysis and asymmetric synthesis.
Latest Patents
Qing-Hua Fan holds a patent for "Soluble polyester-supported chiral phosphines." This innovation involves the preparation of soluble polyester-supported chiral phosphines that have been utilized in the creation of rhodium and ruthenium catalysts. These polymer-supported catalysts exhibit high catalytic activities and enantioselectivities. Notably, the Ru(BINAP) catalyst supported on soluble polyester has demonstrated greater activity compared to its homogeneous counterparts in the asymmetric hydrogenation of 2-arylpropenoic acids. Furthermore, these catalysts can be easily separated from the reaction mixture and reused without any loss of activity and selectivity.
Career Highlights
Qing-Hua Fan is affiliated with The Hong Kong Polytechnic University, where he continues to advance research in catalysis and materials science. His innovative approaches have garnered attention in the academic community and beyond.
Collaborations
Qing-Hua Fan collaborates with Albert Sun-Chi Chan, a fellow researcher who contributes to his work in the field of chiral phosphines and catalysis.
Conclusion
Qing-Hua Fan's contributions to the development of soluble polyester-supported chiral phosphines highlight his innovative spirit and dedication to advancing chemical research. His work not only enhances catalytic processes but also paves the way for future advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
