Santa Clara, CA, United States of America

Qing Hong

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Qing Hong. Retrieved from https://idiyas.com/inventor/qing-hong-dxct5ivh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Qing Hong in Real-Time Selectivity Monitoring

Introduction

Qing Hong is an accomplished inventor based in Santa Clara, CA (US). He has made significant contributions to the field of monitoring film selectivity on substrates. His innovative approach has led to the development of a unique patent that enhances real-time monitoring capabilities.

Latest Patents

Qing Hong holds a patent for "In-situ reflectometry for real-time selectivity monitoring." This patent describes a method that involves generating light from a light source, collimating it to form a beam, and reflecting it off a surface to produce a reflected beam. The reflected beam is then split using a dichroic mirror, allowing for the analysis of film selectivity through data derived from a pyrometer and a spectrometer.

Career Highlights

Qing Hong is currently employed at Applied Materials, Inc., where he continues to push the boundaries of innovation in his field. His work focuses on enhancing the precision and efficiency of monitoring techniques in semiconductor manufacturing.

Collaborations

Qing collaborates with talented professionals, including his coworker Tao Sheng, who brings valuable insights and expertise to their projects.

Conclusion

Qing Hong's contributions to real-time selectivity monitoring exemplify the spirit of innovation in technology. His patent reflects a commitment to advancing methods that improve the efficiency of semiconductor processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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