Shanghai, China

Qiliang Ni

USPTO Granted Patents = 6 

Average Co-Inventor Count = 4.8

ph-index = 1

Forward Citations = 38(Granted Patents)


Company Filing History:


Years Active: 2014-2021

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6 patents (USPTO):Explore Patents

Title: Innovator Qiliang Ni: Pioneering Advances in Semiconductor Technology

Introduction: Qiliang Ni is a prominent inventor based in Shanghai, China, with an impressive portfolio of six patents to his name. His innovative work primarily focuses on advancements in semiconductor technologies, contributing to the efficiency and precision of the industry's manufacturing processes.

Latest Patents: Among Qiliang Ni’s notable inventions are two recent patents that showcase his expertise in detecting minute defects in semiconductor materials. The first patent, titled "Method for Detecting Ultra-Small Defect on Wafer Surface," presents a novel approach for identifying ultra-small defects that can impair the functionality of semiconductor devices. This method involves forming a photoresist pattern to etch the film layer, enabling enhanced detection of defects through innovative scanning techniques.

The second patent, "Method of Detecting and Measuring Contact Alignment Shift Relative to Gate Structures in a Semiconductor Device," provides a systematic approach to assess and measure alignment shifts within semiconductor devices. This method employs a test model array with varying regions, utilizing electron-beam inspection to analyze contact patterns, further refining the precision in semiconductor fabrication.

Career Highlights: Qiliang Ni is currently associated with Shanghai Huali Microelectronics Corporation, a company known for its dedication to microelectronics development and manufacturing. His role at the company underscores his contributions to cutting-edge semiconductor technology, highlighting his ability to bridge theoretical innovation with practical application.

Collaborations: Throughout his career, Qiliang has collaborated with notable colleagues such as Hunglin Chen and Yin Long. These partnerships have been instrumental in advancing research and development efforts, fostering an environment of innovation and knowledge sharing within the sector.

Conclusion: Qiliang Ni stands out as a key figure in semiconductor innovations, leveraging his patent portfolio to drive advancements in the industry. His work not only enhances the capabilities of semiconductor devices but also sets a foundation for future innovations in the technology space. As he continues to push the boundaries of what is possible, his contributions will undoubtedly shape the future of microelectronics.

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