This inventor holds 4 USPTO granted patents and 8 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2025-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025-2026
Title: Qiang Wang: Innovator in Plasma Processing Technologies
Introduction
Qiang Wang is a notable inventor based in Austin, TX, specializing in advanced plasma processing technologies. He holds 4 patents that contribute significantly to the field of plasma characterization and processing systems.
Latest Patents
One of his latest patents is titled "Non-intrusive method for 2D/3D mapping plasma parameters." This innovative method characterizes plasma in a processing chamber by sustaining a plasma generated from a process gas, flowing a probe gas through the chamber, and obtaining spatially-resolved optical emission spectroscopy (OES) signals. The signal intensities are correlated to plasma parameters, allowing for the construction of a 3D map of these parameters, which includes information about their spatial distribution.
Another significant patent is the "Balanced RF resonant antenna system." This invention involves a plasma processing system that includes a plasma chamber, an RF source, a matching circuit, a balun, and a resonating antenna. The resonating antenna features two spiral resonant antennas (SRA) arranged in a symmetrically nested configuration, enhancing the efficiency of plasma processing.
Career Highlights
Qiang Wang is currently employed at Tokyo Electron Limited, where he applies his expertise in plasma processing technologies. His work focuses on developing innovative solutions that improve the efficiency and effectiveness of plasma processing systems.
Collaborations
Throughout his career, Qiang has collaborated with esteemed colleagues, including Peter Lowell George Ventzek and Michael Hummel. These collaborations have furthered advancements in plasma technology and contributed to the success of various projects.
Conclusion
Qiang Wang's contributions to plasma processing technologies through his patents and work at Tokyo Electron Limited highlight his role as an influential inventor in the field. His innovative methods and systems continue to shape the future of plasma processing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile