Qi Liang Ma

Title: Qi Liang Ma - Innovator in Semiconductor Manufacturing

Introduction

Qi Liang Ma is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor manufacturing. His innovative methods have paved the way for advancements in semiconductor structures.

Latest Patents

Qi Liang Ma holds a patent titled "Method of manufacturing a semiconductor structure by forming a mask layer using side wall spacers as an alignment mark." This patent describes a method that includes providing a layer to be etched, which consists of first and second regions. The process involves forming discrete sacrificial layers and using sidewall spacers as alignment marks to create a mask layer that exposes portions of the layer to be etched.

Career Highlights

Throughout his career, Qi Liang Ma has worked with notable companies in the semiconductor industry. He has been associated with Semiconductor Manufacturing International (Shanghai) Corporation and Semiconductor Manufacturing International (Beijing) Corporation. His work in these organizations has contributed to the development of advanced semiconductor technologies.

Collaborations

Qi Liang Ma has collaborated with several professionals in his field, including Song Bai and Tao Song. These collaborations have further enhanced his contributions to semiconductor manufacturing.

Conclusion

Qi Liang Ma is a key figure in the semiconductor industry, with a focus on innovative manufacturing methods. His patent and career achievements reflect his dedication to advancing technology in this critical field.