Hsinchu, Taiwan

Py-Shiun Yeh

This inventor holds 1 USPTO granted patent. Top assignee: Precision Instrument Development Center National Science Council. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Py-Shiun Yeh. Retrieved from https://idiyas.com/inventor/py-shiun-yeh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Py-Shiun Yeh: Innovating Sputter Coating Monitoring

Introduction

Py-Shiun Yeh, an accomplished inventor based in Hsinchu, Taiwan, has made significant contributions in the field of sputter coating technology. With a focus on improving layer uniformity during sputtering processes, Yeh has secured a patent that showcases innovative methodologies for in-situ monitoring.

Latest Patents

Yeh's patent, titled "Method for in-situ monitoring layer uniformity of sputter coating based on intensity distribution of plasma spectrum," introduces a refined method for assessing the uniformity of sputter coatings within a vacuum chamber. The invention leverages plasma emission spectra analysis, applying an Abel inversion method to derive an Ar-normalized Sr intensity distribution, which serves as a spatial representation of the sputtering mass. This method facilitates the calculation of substrate thickness profiles, demonstrating a strong alignment between computed and observed outcomes. Additionally, it enables the monitoring of film uniformity by comparing in-situ measurements against standard curves.

Career Highlights

Yeh is currently affiliated with the Precision Instrument Development Center National Science Council, where his research focuses on advancing coating technologies. His expertise in plasma spectrum analysis has positioned him as a pivotal contributor to his field, aligning with contemporary demands for precision in industrial applications.

Collaborations

Throughout his career, Yeh has collaborated with notable colleagues, including Cheng-Chung Jaing and Chuen-Horng Tsai. These partnerships underscore the collaborative spirit within the research community, enhancing the development and implementation of innovative solutions in technology.

Conclusion

Py-Shiun Yeh exemplifies the drive for innovation within the sputter coating industry. His patent reflects a commitment to enhancing measurement techniques, ultimately paving the way for advancements in materials science. As he continues his work at the Precision Instrument Development Center, Yeh remains a key player in the realm of technological innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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