St. George, UT, United States of America

Puruswottam Aryal

USPTO Granted Patents = 1 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Puruswottam Aryal: Innovator in Nanosilica Compositions

Introduction

Puruswottam Aryal is a notable inventor based in St. George, UT (US). He has made significant contributions to the field of materials science, particularly through his innovative work with nanosilica-based compositions. His research focuses on developing advanced materials that enhance device performance and provide protective coatings.

Latest Patents

Puruswottam Aryal holds a patent for "Nanosilica based compositions, structures and apparatus incorporating same and related methods." This patent describes silica-based compositions that can be utilized in coatings, films, or other cast structures. One embodiment of his invention includes a hybrid nanosilica (HNS) composition that consists of tetraethylorthosilicate (TEOS), methyl triethoxysilane (MTEOS), and glycidoxypropyltrimethoxysilane (GPTMS). The composition is designed to offer various types of protection, such as impact protection and corrosion resistance. Additionally, optically enhancing nanoparticles can be incorporated into the HNS material to serve as an antireflective coating (ARC) for optical applications.

Career Highlights

Puruswottam Aryal is associated with Metashield LLC, where he continues to develop innovative materials and technologies. His work has garnered attention for its potential applications in various industries, including electronics and coatings.

Collaborations

Puruswottam has collaborated with notable colleagues, including Glenn A Mesa, Jr. and Martin Ben-Dayan. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Puruswottam Aryal is a distinguished inventor whose work in nanosilica compositions has the potential to revolutionize protective coatings and enhance device performance. His contributions to materials science are noteworthy and continue to impact various technological fields.

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