This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Imec Vzw, Katholieke Universiteit Leuven. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 2014
Title: The Innovative Journey of Puneet Srivastava: Pioneering III-Nitride Device Technology
Introduction: Puneet Srivastava is an accomplished inventor based in Leuven, Belgium. He has made significant contributions to the field of semiconductor technology with his inventive work on III-nitride devices. With one patent under his name, Puneet's innovative approach has the potential to influence the future of electronics.
Latest Patents: Puneet's sole patent, titled "Method for Fabrication of III-Nitride Device and the III-Nitride Device Thereof," describes a novel III-nitride device that consists of several key components. This device comprises a semiconductor substrate and a stack of active layers made of III-nitride material. Key features include a gate, a source and a drain contact positioned on the stack, with specific projections into the substrate. Notably, it incorporates a trench extending from the backside of the substrate to the underlayer of the active layers. This trench surrounds the drain region and ensures that the drain region is predominantly formed of semiconductor material, thereby enhancing device performance.
Career Highlights: Puneet Srivastava has worked in prestigious organizations, contributing his expertise in semiconductors. He was associated with Imec and Katholieke Universiteit Leuven, which is also known as KU Leuven R&D. His work in these institutions has been pivotal for advancements in the field of semiconductor devices.
Collaborations: Throughout his career, Puneet has collaborated with esteemed colleagues such as Marleen Van Hove and Pawel Malinowski. These collaborations have allowed him to further his research and development efforts, pushing the boundaries of current technology.
Conclusion: Puneet Srivastava’s innovative contributions to the realm of III-nitride devices illustrate the impact of dedicated research and development in semiconductor technology. His patent showcases a significant step forward, and his professional journey highlights the importance of collaboration and expertise in driving innovation in this dynamic field. As the pursuit of new technologies continues, Puneet's work stands as a testament to the transformative power of invention.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile