Guangdong, China

Puh-Yun Lee

This inventor holds 1 USPTO granted patent. Top assignee: Hon Hai Precision Industry Co., Ltd.. Active years: 2007.


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Puh-Yun Lee: Innovator in Fan Control Technology

Introduction

Puh-Yun Lee is a notable inventor based in Guangdong, China. He has made significant contributions to the field of fan control technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of fan operations in various applications.

Latest Patents

Puh-Yun Lee holds a patent for a "System and method for controlling the rotating speed of a fan." This invention outlines a method that includes several steps: reading the standard temperature of a central processing unit (CPU), monitoring the temperature of a thermal diode and the system's ambient temperature, and adjusting the fan's speed based on these readings. The method ensures optimal cooling by increasing the pulse-width modulation (PWM) duty cycle of the fan based on temperature comparisons, thereby enhancing the performance of electronic devices.

Career Highlights

Puh-Yun Lee is associated with Hon Hai Precision Industry Co., Ltd., a leading company in the electronics manufacturing sector. His role at the company has allowed him to work on cutting-edge technologies that improve product performance and reliability. His innovative approach has contributed to the company's reputation for excellence in engineering and design.

Collaborations

Puh-Yun Lee has collaborated with talented coworkers, including Yuh-Ching Chang and Chien-Yi Lo. These collaborations have fostered a creative environment that encourages the development of new ideas and solutions in technology.

Conclusion

Puh-Yun Lee's contributions to fan control technology exemplify the impact of innovation in the electronics industry. His patent demonstrates a commitment to improving device efficiency and performance. Through his work, he continues to influence the field and inspire future advancements.

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