This inventor holds 1 USPTO granted patent. Top assignee: Colorado State University Research Foundation. Active years: 2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2010
Title: Przemyslaw W Wachulak: Innovator in Nanometer-Scale Lithography
Introduction
Przemyslaw W Wachulak is a notable inventor based in Fort Collins, Colorado. He has made significant contributions to the field of nanotechnology, particularly in lithography techniques. His work focuses on advancing the capabilities of patterning at the nanometer scale, which is crucial for various applications in electronics and materials science.
Latest Patents
Wachulak holds a patent for "Nanometer-scale lithography using extreme ultraviolet/soft x-ray laser interferometry." This innovative method describes direct patterning of nanometer-scale features using a 46.9 nm laser. The technique employs multiple exposures with a Lloyd's mirror interferometer, enabling the printing of arrays with features as small as 60 nm FWHM.
Career Highlights
Wachulak is affiliated with the Colorado State University Research Foundation, where he continues to push the boundaries of research in nanotechnology. His work has garnered attention for its potential applications in various high-tech industries.
Collaborations
He has collaborated with esteemed colleagues such as Mario C Marconi and Carmen Menoni, contributing to a rich environment of innovation and research.
Conclusion
Przemyslaw W Wachulak's contributions to nanometer-scale lithography exemplify the intersection of creativity and technology. His innovative approaches are paving the way for future advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile