Prochy Sethna

Title: Prochy Sethna: Innovator in Planarization Processes

Introduction

Prochy Sethna is a notable inventor based in San Jose, CA. He has made significant contributions to the field of semiconductor manufacturing, particularly in planarization processes. His innovative approach has led to advancements that enhance the efficiency and effectiveness of chemical mechanical polishing.

Latest Patents

Prochy Sethna holds a patent for a method of using organic material to enhance STI planarization or other planarization processes. This patent describes a planarization process in which an organic film prevents oxide dishing during the chemical mechanical polishing step. In this process, an organic film with high CMP selectivity to silicon dioxide is spun over silicon dioxide. A patterned mask is then placed over the organic film, and the exposed portions of the organic film are etched away. The remaining portions of the organic film prevent oxide dishing during chemical mechanical polishing because the high CMP selectivity of the organic film to silicon dioxide stops the etching before oxide dishing occurs. The organic film may then be oxygen ashed off the planarized surface if desired. This innovative method has the potential to improve the quality of semiconductor devices.

Career Highlights

Prochy Sethna is currently employed at National Semiconductor Corporation, where he continues to work on cutting-edge technologies in the semiconductor industry. His expertise in planarization processes has made him a valuable asset to the company.

Collaborations

Throughout his career, Prochy has collaborated with talented individuals such as Jen Shu and Michael E. Thomas. These collaborations have fostered an environment of innovation and creativity, leading to advancements in semiconductor manufacturing.

Conclusion

Prochy Sethna's contributions to the field of planarization processes demonstrate his commitment to innovation in semiconductor technology. His patent and work at National Semiconductor Corporation highlight his role as a key figure in advancing manufacturing techniques.