Priya Moni

Title: Innovator Spotlight: Priya Moni

Introduction

Priya Moni, an accomplished inventor based in Worcester, MA, has made significant strides in the field of polymer science. With a unique perspective and innovative approach, she has contributed to advancements in patterning methods that leverage cutting-edge deposition techniques.

Latest Patents

Priya Moni holds a patent for her invention titled "Method of forming topcoat for patterning." This patent discloses a method for the fabrication of polymeric topcoats through initiated chemical vapor deposition (iCVD) or photoinitiated chemical vapor deposition (piCVD). This approach, in conjunction with directed self-assembly (DSA) of block copolymers, enables the generation of high-resolution patterns. The topcoat created via iCVD or piCVD allows for conformal, ultra-thin, uniform, and pinhole-free coatings. Furthermore, her innovation facilitates the use of a diverse range of block copolymer materials for DSA, seamlessly integrating these topcoats into the pattern transfer process.

Career Highlights

Throughout her career, Priya has worked at prestigious institutions, including the Massachusetts Institute of Technology (MIT) and the University of Chicago. These experiences have undoubtedly shaped her understanding and capabilities in materials science and polymer engineering.

Collaborations

Priya Moni has collaborated with notable colleagues such as Do Han Kim and Hyo Seon Suh. Their joint efforts have played a crucial role in advancing research and development in polymer deposition and patterning methods.

Conclusion

Priya Moni exemplifies the spirit of innovation through her groundbreaking work in polymer topcoats and patterning technologies. Her contributions not only enhance the scientific community but also pave the way for future advancements in material science.