Company Filing History:
Years Active: 2019
Title: Preetpal Singh: Innovator in Semiconductor Technology
Introduction
Preetpal Singh is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative work involving porous graphene films.
Latest Patents
Preetpal Singh holds a patent for a "Semiconductor structure having a single or multiple layer porous graphene film and the fabrication method thereof." This invention features a semiconductor structure that includes a sapphire substrate, a single or multiple layer porous graphene film, and a gallium nitride layer. The fabrication method involves several steps, including growing graphene on copper foil, washing the sapphire substrate with acetone and isopropyl alcohol, and transferring the graphene onto the semiconductor substrate. The process also utilizes photolithography to etch the porous graphene layer and metalorganic chemical vapor deposition to deposit gallium nitride.
Career Highlights
Preetpal Singh is affiliated with Chang Gung University, where he continues to advance his research in semiconductor technologies. His work has garnered attention for its potential applications in various electronic devices.
Collaborations
Some of his notable coworkers include Chao-Sung Lai and Cher-Ming Tan, who contribute to the collaborative research environment at Chang Gung University.
Conclusion
Preetpal Singh's innovative work in semiconductor technology, particularly with porous graphene films, showcases his commitment to advancing the field. His contributions are paving the way for future developments in electronics.