East Amherst, NY, United States of America

Prasad Shrikrishna Apte


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Prasad Shrikrishna Apte: Innovator in Thermal Spray Coatings

Introduction

Prasad Shrikrishna Apte is a notable inventor based in East Amherst, NY (US). He has made significant contributions to the field of thermal spray coatings, which are essential for enhancing the durability of various substrates under severe conditions.

Latest Patents

One of his key patents is titled "Thermal spray coatings and applications therefor." This invention relates to coatings for a metal or non-metal substrate that includes a thermal sprayed bondcoat layer and a thermal sprayed ceramic layer. The coating is designed to have a helium leak rate of less than 6×10 standard cubic centimeters per second. The bondcoat layer comprises an alloy of MCrAlM', where M is selected from nickel, cobalt, iron, and mixtures thereof, while M' is selected from yttrium, zirconium, hafnium, ytterbium, and mixtures thereof. The alloy is thermally sprayed from a powder with a mean particle size ranging from about 5 microns to about 100 microns. These coatings are particularly useful for extending the service life of metallurgical vessels' lances, nozzles, and tuyeres.

Career Highlights

Prasad works at Praxair Surface Technologies, Inc., where he continues to innovate in the field of thermal spray technology. His work has been instrumental in developing coatings that withstand extreme conditions, thereby improving the performance and longevity of industrial components.

Collaborations

He has collaborated with notable colleagues such as James Patrick Meagher and Shawn W Callahan, contributing to advancements in thermal spray applications.

Conclusion

Prasad Shrikrishna Apte's contributions to thermal spray coatings exemplify the importance of innovation in enhancing industrial processes. His work not only showcases his expertise but also highlights the potential for further advancements in this critical area of technology.

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