Prakash Nahata

Title: Prakash Nahata: Innovator in Photo Resist Film Technology

Introduction

Prakash Nahata is a notable inventor based in Coral Springs, FL (US). He has made significant contributions to the field of photo resist film technology. His innovative work has led to the development of a unique mechanism that enhances the application of photo resist films.

Latest Patents

Prakash Nahata holds 1 patent for his invention titled "Photo resist film application mechanism." This patent describes a dry film photoresist laminator that includes a punch and die assembly. The assembly punches a rolled sheet of dry film photoresist material, which consists of a dry film photoresist material sandwiched between a Mylar top layer and a polyolefin bottom layer, into photoresist decals. The decals are then bonded to a tacky transport tape, which carries them to a polyolefin peeler assembly. This assembly rolls a high tack tape along the polyolefin layer of the decal, effectively peeling it from the decal. The decal is advanced by a laminating assembly that rolls it onto a heated wafer, thereby bonding the exposed photoresist material to the wafer. The bonded wafer and decal are subsequently removed from the transport tape.

Career Highlights

Prakash Nahata is currently employed at International Business Machines Corporation (IBM). His work at IBM has allowed him to further develop his expertise in photo resist film applications and contribute to advancements in the field.

Collaborations

Throughout his career, Prakash has collaborated with notable colleagues, including William A Brady and See Ark Chan. These collaborations have fostered an environment of innovation and creativity, leading to significant advancements in their respective fields.

Conclusion

Prakash Nahata's contributions to photo resist film technology exemplify the spirit of innovation. His patent and work at IBM highlight his commitment to advancing technology in this specialized area.