Prabu Gopalraja

Title: Prabu Gopalraja: Innovator in Plasma Reactor Technology

Introduction

Prabu Gopalraja is a notable inventor based in San Jose, CA (US). He has made significant contributions to the field of plasma processing technology. With a total of 4 patents to his name, Gopalraja continues to push the boundaries of innovation in his area of expertise.

Latest Patents

One of Gopalraja's latest patents is titled "System for tunable workpiece biasing in a plasma reactor." This invention provides systems and methods for tunable workpiece biasing in a plasma reactor. The system includes a plasma chamber that performs plasma processing on a workpiece, a first pulsed voltage source directly coupled to the workpiece, and a second pulsed voltage source capacitively coupled to the workpiece. Additionally, it features a biasing controller comprising one or more processors and memory. The memory contains a set of computer instructions that, when executed by the processors, independently control the first and second pulsed voltage sources based on various parameters. This innovation aims to tailor the ion energy distribution of the flux of ions directed to the workpiece.

Career Highlights

Prabu Gopalraja is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to develop cutting-edge technologies that enhance plasma processing capabilities.

Collaborations

Gopalraja has collaborated with notable coworkers such as Travis Koh and Philip Allan Kraus. Their combined expertise contributes to the innovative environment at Applied Materials.

Conclusion

Prabu Gopalraja is a distinguished inventor whose work in plasma reactor technology has led to significant advancements in the field. His contributions continue to shape the future of plasma processing, making him a key figure in the industry.