Ponce Saopraseuth

Title: Innovations by Ponce Saopraseuth

Introduction

Ponce Saopraseuth is an accomplished inventor based in Gresham, OR (US). He holds a total of 5 patents that showcase his expertise in the field of electrical engineering and materials science. His innovative work primarily focuses on the development of advanced capacitor technologies and dielectric materials.

Latest Patents

One of his notable patents is for a "Capacitor with stoichiometrically adjusted dielectric and method of fabricating same." This invention involves fabricating a capacitor and its dielectric material by adjusting the amount of an ionic conductive species, such as hydrogen, to achieve specific electrical characteristics. The process utilizes silicon, nitrogen, and hydrogen to control the stoichiometric ratio, ensuring optimal performance. Another significant patent is the "Process for forming a low k carbon-doped silicon oxide dielectric material on an integrated circuit structure." This process enhances planarity and gap fill in high aspect ratio regions, improving film strength and reducing byproducts trapped in the film.

Career Highlights

Ponce Saopraseuth is currently employed at LSI Logic Corporation, where he continues to contribute to advancements in semiconductor technology. His work has significantly impacted the efficiency and performance of integrated circuits.

Collaborations

Throughout his career, Ponce has collaborated with notable colleagues, including Derryl D J Allman and Nabil Mansour. These collaborations have fostered innovation and the sharing of ideas within the field.

Conclusion

Ponce Saopraseuth's contributions to capacitor technology and dielectric materials demonstrate his commitment to innovation in electrical engineering. His patents reflect a deep understanding of materials science and a dedication to advancing technology.