Company Filing History:
Years Active: 2022
Title: Po-Sheng Chang: Innovator in Semiconductor Technology
Introduction
Po-Sheng Chang is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to fabrication processes.
Latest Patents
Chang's latest patents include a method of fabricating transistors with short gate lengths using two-step photolithography. This method effectively utilizes a stepper to control the first and second exposed positions, allowing for precise adjustments to the gate length. Another notable patent involves a process for making interconnects in group III-V semiconductor devices. This process includes several steps, such as applying a positive photoresist layer, subjecting it to patternwise exposure, and depositing a copper layer, ultimately leading to the creation of efficient interconnects.
Career Highlights
Po-Sheng Chang is affiliated with National Yang Ming Chiao Tung University, where he continues to advance research in semiconductor technologies. His work has garnered attention for its practical applications in the electronics industry.
Collaborations
Chang collaborates with esteemed colleagues, including Yueh-Chin Lin and Yi Chang, contributing to a dynamic research environment that fosters innovation.
Conclusion
Po-Sheng Chang's contributions to semiconductor technology through his patents and research at National Yang Ming Chiao Tung University highlight his role as a key innovator in the field. His work continues to influence advancements in electronics and fabrication processes.