Taichung, Taiwan

Po-Lung Yang

This inventor holds 1 USPTO granted patent. Top assignee: Chang Gung University. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Po-Lung Yang. Retrieved from https://idiyas.com/inventor/po-lung-yang-msmsi0of

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 11.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Po-Lung Yang: Innovator in Plasma Treatment Technology

Introduction

Po-Lung Yang is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of surface modification through his innovative approach to plasma treatment technology. His work is particularly focused on enhancing the bonding processes used in various applications.

Latest Patents

Yang holds a patent for a groundbreaking method known as the NHplasma treatment by remote plasma. This method is proposed to replace the traditional covalent bonding process during surface modification procedures aimed at generating amine bonds. His patent represents a significant advancement in the field, showcasing his commitment to innovation.

Career Highlights

Po-Lung Yang is affiliated with Chang Gung University, where he continues to engage in research and development. His academic background and professional experience have positioned him as a leader in his field. With a focus on practical applications, Yang's work has the potential to impact various industries.

Collaborations

Yang has collaborated with esteemed colleagues, including Chao-Sung Lai and Jau-Song Yu. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise, further enhancing the quality of their research.

Conclusion

In summary, Po-Lung Yang is a distinguished inventor whose work in plasma treatment technology is paving the way for advancements in surface modification processes. His contributions are valuable to both academia and industry, reflecting his dedication to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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