Po-Jung Lin

Title: Po-Jung Lin: Innovator in Semiconductor Epitaxy Technology

Introduction

Po-Jung Lin is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 9 patents. His work focuses on innovative methods and systems that enhance the manufacturing processes of semiconductor epitaxy structures.

Latest Patents

One of Po-Jung Lin's latest patents is a method and system for manufacturing semiconductor epitaxy structures. This system includes a deposition apparatus, a curvature monitor system, and a control unit. The deposition apparatus is designed to sequentially deposit a buffer layer, a first epitaxy layer, an insertion layer, and a second epitaxy layer onto a substrate. The curvature monitor system is responsible for monitoring the curvature value of the semiconductor epitaxy structure. The control unit manages the deposition process, ensuring that the apparatus stops depositing layers based on the curvature value measured by the monitor system. This innovative system effectively controls the strain of the semiconductor epitaxy structure during growth, showcasing Lin's expertise in the field.

Career Highlights

Throughout his career, Po-Jung Lin has worked with notable companies such as Altek Corporation and Hermes-Epitek Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

Po-Jung Lin has collaborated with several talented individuals in his field, including Shuei-Lin Chen and Da-Ming Chang. These collaborations have further enriched his work and led to innovative solutions in semiconductor manufacturing.

Conclusion

Po-Jung Lin is a distinguished inventor whose contributions to semiconductor epitaxy technology have made a significant impact in the industry. His innovative methods and systems continue to advance the field, demonstrating his commitment to excellence in technology.