This inventor holds 1 USPTO granted patent. Top assignee: Eton Technology, Inc.. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Po-Hung Chen: Innovator in DRAM Technology
Introduction
Po-Hung Chen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of dynamic random-access memory (DRAM) technology. His innovative approach has led to the development of a unique global row redundancy scheme that enhances the efficiency of DRAM designs.
Latest Patents
Po-Hung Chen holds 1 patent for his invention titled "Area efficient global row redundancy scheme for DRAM." This invention describes a global row redundancy scheme that effectively utilizes chip resources to create an area-efficient design. The DRAM is constructed from two types of memory blocks: one with a redundant cell array and one without. Both types contain a memory cell array and bit line sense amplifiers. The design allows for the sharing of sense amplifiers, thus eliminating the need for additional amplifiers solely for the redundant cell array. This innovative approach maximizes yield by enabling repairs to any row with a failed memory cell using unused rows in any redundant cell array.
Career Highlights
Po-Hung Chen is currently employed at Eton Technology, Inc., where he continues to push the boundaries of memory technology. His work has been instrumental in advancing DRAM efficiency and reliability.
Collaborations
Throughout his career, Po-Hung has collaborated with talented individuals such as Chun Shiah and Bor-Doou Rong. These partnerships have fostered a creative environment that encourages innovation and problem-solving in the field of memory technology.
Conclusion
Po-Hung Chen's contributions to DRAM technology exemplify the impact of innovative thinking in the electronics industry. His work not only enhances the efficiency of memory designs but also paves the way for future advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile