Hsinchu, Taiwan

Po-Fan Hsu

This inventor holds 1 USPTO granted patent. Top assignee: Ritek Corporation. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Po-Fan Hsu. Retrieved from https://idiyas.com/inventor/po-fan-hsu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Po-Fan Hsu: Innovator in Optical Recording Technology

Introduction

Po-Fan Hsu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of optical recording technology. His innovative work has led to the development of a unique recording material that enhances the capabilities of optical recording media.

Latest Patents

Hsu holds a patent for an optical recording medium and the recording material associated with it. The patent discloses a recording material characterized by a composition represented by a general formula of BiGeO. The atomic ratios of bismuth and germanium in this formula satisfy specific requirements, ensuring optimal performance in optical recording applications. He has 1 patent to his name.

Career Highlights

Po-Fan Hsu is currently employed at Ritek Corporation, a leading company in the optical storage industry. His work at Ritek has allowed him to focus on advancing optical recording technologies and materials. His contributions have been instrumental in enhancing the efficiency and effectiveness of optical media.

Collaborations

Hsu has collaborated with several talented individuals in his field, including Wei-Chong Li and Wei-Hsiang Wang. These collaborations have fostered innovation and have led to advancements in optical recording technologies.

Conclusion

Po-Fan Hsu is a distinguished inventor whose work in optical recording technology has made a significant impact. His innovative patent and contributions to Ritek Corporation highlight his dedication to advancing the field. His collaborations further emphasize the importance of teamwork in driving technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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