Yunlin, Taiwan

Po-Chun Chen

This inventor holds 1 USPTO granted patent. Top assignee: Realtek Semiconductor Inc.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Po-Chun Chen. Retrieved from https://idiyas.com/inventor/po-chun-chen-p16irf5b

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Po-Chun Chen: Innovator in Filter Design

Introduction

Po-Chun Chen is a notable inventor based in Yunlin, Taiwan. He has made significant contributions to the field of electronic filter design. His innovative approach has led to the development of a unique filter design method that utilizes capacitors effectively.

Latest Patents

Po-Chun Chen holds a patent for a "Two-capacitor-based filter design method and two-capacitor-based filter." This patent outlines a method that includes determining a frequency and a fractional bandwidth ratio. It involves selecting two capacitors based on these parameters and determining the lengths of transmission lines accordingly. This design enhances the performance of electronic filters.

Career Highlights

Po-Chun Chen is associated with Realtek Semiconductor Inc., a leading company in the semiconductor industry. His work at Realtek has allowed him to apply his innovative ideas in practical applications, contributing to the company's success in the market.

Collaborations

He has collaborated with notable colleagues such as Ruey-Beei Wu and Ting-Ying Wu. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Po-Chun Chen's contributions to filter design exemplify the impact of innovative thinking in technology. His patent and work at Realtek Semiconductor Inc. highlight his role as a key inventor in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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