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For the Inventor, By the Inventor

Miaoli, Taiwan

Po-Ching Lin

This inventor holds 5 USPTO granted patents and 4 published patent applications. Top assignees: Innolux Corporation, Chimei Innolux Corporation, Innocom Technology(shenzhen) Co., Ltd.. Active years: 2014-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Po-Ching Lin. Retrieved from https://idiyas.com/inventor/po-ching-lin-a7wj26ij

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5 

% Patents Active = 100.0

Average Co-Inventor Count = 4.3

ph-index = 1

Forward Citations = 5(Granted Patents)


Location History:

  • Chu-Nan, TW (2016)
  • Miao-Li County, TW (2014 - 2018)

Company Filing History:

goldMedal4 out of 2,460 
 
Innolux Corporation
 patents
silverMedal1 out of 601 
 
Chimei Innolux Corporation
 patents
bronzeMedal1 out of 306 
 
Innocom Technology(shenzhen) Co., Ltd.
 patents
where one patent can have more than one assignee

Years Active: 2014-2018

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5 patents (USPTO):Explore Patents
1. 10115696 - Electronic device and method for manufacturing the same (2018-10-30),
2. 9768414 - Display device (2017-09-19),
3. 9457551 - Method for manufacturing display (2016-10-04),
4. 9246128 - Organic light emitting diode display device having metal enclosing wall (2016-01-26),
5. 8767164 - Thin film transistor substrate and display apparatus using the same and manufacturing method thereof (2014-07-01),

Title: Po-Ching Lin: Innovator in Electronic Devices

Introduction

Po-Ching Lin is a notable inventor based in Miao-Li County, Taiwan. He has made significant contributions to the field of electronic devices, holding a total of 5 patents. His work focuses on innovative methods and devices that enhance electronic technology.

Latest Patents

Among his latest patents, Lin has developed an electronic device and a method for manufacturing the same. This electronic device comprises a first substrate, an adhesion layer made from a condensation product of silane or its derivatives, an inorganic layer, and an active unit. Additionally, he has patented a display device that includes a first substrate, a first barrier layer, a second substrate, a second barrier layer, and a display medium situated between the two barrier layers. The design also features a metal enclosing wall that connects the first and second substrates while surrounding the display medium.

Career Highlights

Throughout his career, Po-Ching Lin has worked with prominent companies such as Innolux Corporation and Innocom Technology (Shenzhen) Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects.

Collaborations

Lin has collaborated with talented individuals in his field, including Chi-Che Tsai and Wei-Yen Wu. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Po-Ching Lin's contributions to electronic devices and his innovative patents highlight his role as a significant inventor in the technology sector. His work continues to influence advancements in electronic manufacturing and design.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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