Piyush Mohan Sinha

Title: Innovations of Piyush Mohan Sinha

Introduction

Piyush Mohan Sinha is a notable inventor based in Portland, OR, who has made significant contributions to the field of integrated circuit structures. With a total of two patents to his name, Sinha's work focuses on enhancing the performance and efficiency of electronic devices.

Latest Patents

Sinha's latest patents include a device contact in integrated circuit structures. This invention discusses an integrated circuit (IC) structure that features a first source/drain (S/D) contact, a gate contact in contact with both the gate and the first S/D contact, and a second S/D contact with a height less than that of the first S/D contact. Another significant patent is related to transistor arrangements with metal gate cuts and recessed power rails. This invention describes a process for forming a metal gate cut as a trench that is non-selective to the gate sidewalls. The etch process improves accuracy, cost-efficiency, and device performance compared to conventional methods. Additionally, the process allows for the creation of recessed power rails, which can reduce metal line resistance and voltage droop.

Career Highlights

Piyush Mohan Sinha is currently employed at Intel Corporation, a leading technology company known for its innovations in semiconductor manufacturing. His work at Intel has positioned him as a key player in the development of advanced electronic components.

Collaborations

Sinha has collaborated with notable colleagues, including Andy Chih-Hung Wei and Sean T Ma, contributing to the advancement of technology in their respective fields.

Conclusion

Piyush Mohan Sinha's contributions to integrated circuit technology through his patents reflect his innovative spirit and dedication to improving electronic devices. His work continues to influence the industry and pave the way for future advancements.