Debica, Poland

Piotr Cyran

This inventor holds 1 USPTO granted patent and 3 EPO patents. Top assignees: Bsh Hausgerate Gmbh, Terraplasma Gmbh. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Piotr Cyran. Retrieved from https://idiyas.com/inventor/piotr-cyran

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Piotr Cyran: Inventor of a Safety-Focused Plasma Device.

Introduction

Piotr Cyran is an inventor based in Dębica, Poland. His work includes a plasma device designed to apply cold atmospheric plasma to surfaces such as textiles, leather, and plastic fibers.

Latest Patents

Cyran is associated with 1 patent, titled “Plasma device.” The invention uses an actuator to activate a plasma source only when the distance between the source and the surface being treated is below a predetermined threshold. An adjustable, preloaded actuator element includes at least one activation element, while a recording apparatus captures the actuator element’s position when the threshold condition is met. This design aims to reduce risks from incorrect operation and prevent unwanted emissions by limiting activation to situations in which the item being treated is sufficiently close.

Career Highlights

Cyran has been associated with BSH Hausgeräte GmbH and terraplasma GmbH. His patent reflects an application of plasma technology to the treatment of materials, with an emphasis on controlled operation.

Collaborations

Cyran’s listed coworkers include Florian Michl and Tobias Wende.

Conclusion

Piotr Cyran’s patented plasma device combines cold atmospheric plasma treatment with distance-based activation controls, highlighting a practical approach to safer and more controlled material processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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