Pin Zhao

Title: The Innovative Contributions of Pin Zhao

Introduction

Pin Zhao is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of material science, particularly through his innovative patent related to the formation of material layers. His work reflects a deep understanding of advanced manufacturing processes and materials.

Latest Patents

Pin Zhao holds a patent titled "Method of forming material layer." This patent describes a method that includes providing a non-photosensitive mask on a substrate to expose a partial region of the substrate. The process involves forming a material film on this partial region using a sputtering process, followed by the removal of the non-photosensitive mask. The substrate and the material film undergo heat treatment under a first gas atmosphere. The material film consists of a transition metal and a chalcogen element, and the sputtering process may include an RF magnetron sputtering technique. Notably, the heat treatment is performed at a higher temperature than that used for forming the material film.

Career Highlights

Throughout his career, Pin Zhao has worked with prominent organizations, including Samsung Electronics Co., Ltd. and Sungkyunkwan University. His experience in these institutions has allowed him to develop and refine his expertise in material science and engineering.

Collaborations

Pin Zhao has collaborated with various professionals in his field, including his coworker Sangwoo Kim. These collaborations have contributed to the advancement