Eindhoven, Netherlands

Pim Lohmeijer

This inventor holds 1 USPTO granted patent. Top assignee: Shell USA, Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pim Lohmeijer. Retrieved from https://idiyas.com/inventor/pim-lohmeijer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Pim Lohmeijer: Innovator in Microcrystalline Wax Technology

Introduction

Pim Lohmeijer is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of materials science, particularly in the development of microcrystalline wax.

Latest Patents

Lohmeijer holds a patent for a microcrystalline wax that exhibits a needle penetration according to ASTM D-1321 at 25° C. of more than 1. This innovative wax has a crystallinity according to XRD between 5 and 70%, an initial boiling point of less than 500° C., and a congealing point ranging from 60 to 120° C. Additionally, it has an oil content according to ASTM D-721 of more than 2 wt. %. The microcrystalline wax also contains a fraction up to C40 with at least 5 wt % of multiple methyl-branched paraffins as determined with GC×GC.

Career Highlights

Lohmeijer is currently employed at Shell USA, Inc., where he continues to advance his research and development efforts in wax technology. His work has positioned him as a key figure in the industry.

Collaborations

He has collaborated with notable colleagues, including Andries Hendrik Janssen and Gerrit Leendert Bezemer, contributing to various projects and innovations in the field.

Conclusion

Pim Lohmeijer is a distinguished inventor whose work in microcrystalline wax technology has made a significant impact in the materials science sector. His innovative patent and collaborations highlight his contributions to the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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