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For the Inventor, By the Inventor

Saint Egreve, France

Pierre Nicolas

USPTO Granted Patents = 8 

Average Co-Inventor Count = 1.9

ph-index = 2

Forward Citations = 6(Granted Patents)


Location History:

  • St. Egreve, FR (1999 - 2005)
  • Sr Eqre've, FR (2005)
  • St Egreve, FR (2007)
  • Saint Egreve, FR (1991 - 2010)

Company Filing History:

goldMedal8 out of 3,559 
 
Commissariat a L'energie Atomique
 patents

Years Active: 1991-2010

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8 patents (USPTO):Explore Patents
1. 7838839 - Hybrid multibeam electronic emission device with controlled divergence (2010-11-23),
2. 7800085 - Microelectronic multiple electron beam emitting device (2010-09-21),
3. 7755270 - Cathode structure with nanotubes for emissive screen (2010-07-13),
4. 7280088 - Method and device for controlling a matrix electron source, with regulation by the emitted charge (2007-10-09),
5. 6876344 - Flat thermionic emission screen and with integrated anode control device (2005-04-05),
6. 6862010 - Method and device for controlling the voltage of a matrix structure electron source, with regulation of the emitted charge (2005-03-01),
7. 5929433 - Reading device for a mosaic of electromagnetic detectors and detection (1999-07-27),
8. 5008544 - System for the detection of information in the form of electromagnetic (1991-04-16),

Title: Innovations of Pierre Nicolas

Introduction

Pierre Nicolas is a notable inventor based in Saint Egreve, France. He has made significant contributions to the field of electronic emission devices, holding a total of eight patents. His work focuses on advancing technology in electron beam applications.

Latest Patents

Among his latest patents is the "Hybrid multibeam electronic emission device with controlled divergence." This innovative device includes multiple electron beams and features a first structure with several emission sources, hybridized with a second structure that contains multiple diaphragm openings. Another significant patent is the "Microelectronic multiple electron beam emitting device." This device emits several beams of electrons and consists of a first structure with a plurality of electron beam emission micro-sources, along with a second structure designed to collect the emitted electrons and facilitate secondary emission. This technology is particularly applicable in the field of direct writing lithography.

Career Highlights

Pierre Nicolas is associated with the Commissariat à l'Énergie Atomique, where he continues to develop cutting-edge technologies. His work has been instrumental in enhancing the capabilities of electronic emission devices.

Collaborations

He has collaborated with notable coworkers, including Denis Sarrasin and Yohan Desieres, contributing to various projects and innovations in their field.

Conclusion

Pierre Nicolas stands out as a prominent inventor in the realm of electronic emission devices, with a strong portfolio of patents that reflect his innovative spirit and dedication to advancing technology.

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