Pierre J Bouchard

Title: Innovations of Pierre J Bouchard

Introduction

Pierre J Bouchard is a notable inventor based in South Burlington, VT (US). He has made significant contributions to the field of technology, particularly in the areas of lithography and design processes. With a total of 5 patents, Bouchard has demonstrated his expertise and innovative spirit throughout his career.

Latest Patents

One of Bouchard's latest patents is titled "Lithographic error reduction by pattern matching." This invention involves generating a library of waivable images with corresponding waiver constraints. Each waivable image represents a region of a reference design layout that includes a raw error identified by an optical rule checks (ORC) program. The process does not require a correction for printability on a photoresist layer. By running the ORC program on a target design layout, a list of raw errors is created. Error region images are then generated by selecting regions around points corresponding to these raw errors. A list of matches between the library of waivable images and the error region images is compiled, allowing for the removal of a subset of raw errors to generate a list of real errors.

Another significant patent is the "System and method of automatically generating kerf design data." This invention provides a method and system that utilizes the same design manipulation processes for both chip design and kerf design. The concurrent generation of kerf designs and chip designs ensures a consistent, accurate, and repeatable process. This innovation improves the quality of wafer testing results, as the data in the kerf aligns with the data in the chip. Additionally, the total cycle time for mask manufacturing is reduced because kerf build is completed prior to the start of the mask manufacturing process. The invention also optimizes computing resources through load balancing across multiple servers during kerf and chip design.

Career Highlights

Pierre J Bouchard is currently employed at International Business Machines Corporation (IBM), where he continues to contribute to advancements in technology. His work has had a lasting impact on the industry, particularly in the fields of lithography and design processes.

Collaborations

Bouchard has collaborated with notable colleagues, including Howard Ted Barrett and James B Clairmont. These partnerships have further enhanced his innovative contributions to the field.

Conclusion

Pierre J Bouchard is a distinguished inventor whose work has significantly advanced technology in lithography and