La Garenne Colombes, France

Pierre Delaleau

This inventor holds 1 USPTO granted patent, plus 1 CIPO patent and 1 EPO patent. Top assignee: Safran Aircraft Engines. Active years: 2018.


% Patents Active = 100.0


 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Pierre Delaleau: Innovator in Hollow Vane Technology

Introduction

Pierre Delaleau is a notable inventor based in La Garenne Colombes, France. He has made significant contributions to the field of engineering, particularly with his innovative approach to hollow vane technology. His work has implications for various industries, including aerospace.

Latest Patents

Delaleau holds a patent for a hollow vane and its associated production method. This invention features a main portion with a cavity that is closed by a cover. The production process involves expanding the main portion relative to the cover, utilizing differential thermal expansion. The cover is then placed at the bottom of the cavity's opening before the main portion closes again. This design effectively avoids the disadvantages associated with welding, glue, or assembly parts, enhancing the efficiency and reliability of the component.

Career Highlights

Throughout his career, Pierre Delaleau has worked with prominent companies in the aerospace sector, including Safran Aircraft Engines and Snecma. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge projects.

Collaborations

Delaleau has collaborated with talented individuals such as Guillaume Fribourg and Florian Tellier. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Pierre Delaleau's contributions to hollow vane technology exemplify his innovative spirit and dedication to engineering. His patent and collaborations highlight the importance of teamwork in advancing technological solutions.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
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