Livron sur Drome, France

Pierre Bey

This inventor holds 1 USPTO granted patent. Top assignee: Soitec. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pierre Bey. Retrieved from https://idiyas.com/inventor/pierre-bey

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Pierre Bey - Innovator in Germanium Layer Polishing

Introduction

Pierre Bey is a notable inventor based in Livron sur Drome, France. He has made significant contributions to the field of materials science, particularly in the polishing of germanium layers. His innovative approach has led to advancements that enhance the quality of semiconductor materials.

Latest Patents

Pierre Bey holds a patent for a method of germanium layer polishing. This invention involves a two-step chemical-mechanical polishing process. The first step utilizes a polishing solution with an acidic pH, followed by a second step with an alkaline pH. The result is a polished heteroepitaxial germanium layer that achieves a surface microroughness of less than 0.1 nm RMS and a surface haze level of less than 0.5 ppm.

Career Highlights

Pierre Bey is currently employed at Soitec, a company known for its expertise in semiconductor materials. His work at Soitec has allowed him to apply his innovative ideas in a practical setting, contributing to the advancement of technology in the semiconductor industry.

Collaborations

Pierre collaborates with Muriel Martinez, who is also involved in the field of materials science. Their partnership exemplifies the collaborative spirit that drives innovation in technology.

Conclusion

Pierre Bey's contributions to germanium layer polishing demonstrate his commitment to advancing semiconductor technology. His innovative methods and collaboration with industry professionals continue to impact the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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