Phong Ngo

Title: Phong Ngo: Innovator in Plasma Technology

Introduction

Phong Ngo is a notable inventor based in Tucson, AZ, who has made significant contributions to the field of plasma technology. With a total of 3 patents to his name, he has developed innovative solutions that enhance the efficiency of sputtering processes.

Latest Patents

One of his latest patents is titled "Magnetic Anode for Sputter Magnetron Cathode." This invention features a rotary sputter magnetron assembly designed for sputtering target material onto a substrate. The assembly includes a target tube that extends about a magnet array, generating a plasma confining magnetic field. The target tube is supported for rotation about its longitudinal central axis, with side shunts positioned parallel to it.

Another significant patent is "Rotary Magnetron Magnet Bar and Apparatus Containing the Same for High Target Utilization." This apparatus is designed for coating substrates and includes a racetrack-shaped plasma source. The target material is positioned in proximity to the plasma source for effective sputtering. The design allows for a target utilization of up to 87 weight percent of the initial target weight, showcasing Phong's innovative approach to maximizing efficiency.

Career Highlights

Phong Ngo is currently employed at General Plasma Inc., where he continues to push the boundaries of plasma technology. His work has been instrumental in developing advanced sputtering techniques that are widely used in various industries.

Collaborations

Throughout his career, Phong has collaborated with talented individuals such as John Eric Madocks and Patrick Lawrence Morse. These collaborations have further enriched his work and contributed to the success of his projects.

Conclusion

Phong Ngo is a distinguished inventor whose contributions to plasma technology have made a lasting impact. His innovative patents and ongoing work at General Plasma Inc. highlight his commitment to advancing the field.