The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2020
Filed:
Oct. 26, 2015
Applicant:
General Plasma Inc., Tucson, AZ (US);
Inventors:
Phong Ngo, Tucson, AZ (US);
John E. Madocks, Tucson, AZ (US);
Assignee:
General Plasma, Inc., Tucson, AZ (US);
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3423 (2013.01); H01J 37/3405 (2013.01); H01J 37/345 (2013.01); H01J 37/3438 (2013.01); H01J 37/3452 (2013.01);
Abstract
A rotary sputter magnetron assembly for use in sputtering target material onto a substrate is provided. The assembly comprises a longitudinally extending target tube having a longitudinal central axis, said target tube extending about a magnet array that is configured to generate a plasma confining magnetic field adjacent the target tube, said target tube supported for rotation about its longitudinal central axis and a pair of side shunts positioned parallel to the longitudinal central axis, and on opposing lengthwise sides of said target tube.