Bethel, CT, United States of America

Phillip Chen


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: The Innovative Ingenuity of Phillip Chen in Microelectronics

Introduction: Phillip Chen, based in Bethel, CT, is a distinguished inventor known for his groundbreaking contributions to the field of microelectronics. With a patent focused on the plasma-assisted dry etching of noble metal-based materials, Chen has made significant strides in advancing manufacturing techniques vital for the electronics industry.

Latest Patents: Chen holds a patent for a method titled "Plasma-assisted dry etching of noble metal-based materials." This innovative process facilitates the removal and dry etching of noble metal-based structures, specifically iridium, which is critical for electrode formation in microelectronic devices. The approach involves utilizing plasma formed from one or more halogenated organic and/or inorganic substances, combined with oxidizing gas, to achieve effective etching conditions. This technology allows for high-rate fabrication of devices where noble metals serve as electrodes or conductive features, enhancing efficiency and precision in microelectronic manufacturing.

Career Highlights: Phillip Chen's career is marked by his role at Advanced Technology Materials, Inc., where he works on cutting-edge technologies that push the limits of microelectronics. His expertise in plasma etching processes has garnered attention within the industry and contributes to the company's reputation for innovation and quality in semiconductor manufacturing.

Collaborations: Throughout his career, Chen has collaborated with other talented professionals, including Thomas H Baum and Frank DiMeo, Jr. These partnerships have fostered an environment of collective innovation and development, further enhancing the impact of their work on the microelectronics landscape.

Conclusion: Phillip Chen's contributions to the field of microelectronics, highlighted by his patented process for plasma-assisted dry etching, exemplify the innovative spirit required in today's technology-driven world. His ongoing work at Advanced Technology Materials, Inc. not only reflects his dedication to technological advancement but also positions him as a notable figure among inventors striving to revolutionize the industry.

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