Volkrange, France

Philippe Plaindoux

This inventor holds 2 USPTO granted patents. Top assignees: Neypric, Neyrpic. Active years: 1994-1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Philippe Plaindoux. Retrieved from https://idiyas.com/inventor/philippe-plaindoux

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 1994-1995

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2 patents (USPTO):Explore Patents

Title: Philippe Plaindoux: Innovator in Metallic Finishes

Introduction

Philippe Plaindoux is a notable inventor based in Volkrange, France. He has made significant contributions to the field of materials science, particularly in developing advanced metallic finishes. With a total of 2 patents, his work focuses on enhancing the durability and resistance of metal surfaces.

Latest Patents

His latest patents include a method for forming a wear and corrosion-resistant metallic finish. The finishes of the present invention consist essentially of metal alloys having a specific general formula. These amorphous alloy-based metallic finishes are designed to provide superior wear and corrosion resistance, making them ideal for various industrial applications.

Career Highlights

Throughout his career, Philippe has worked with prominent companies such as Neypric and Neyrpic. His experience in these organizations has allowed him to refine his expertise in materials engineering and innovation.

Collaborations

Philippe has collaborated with several professionals in his field, including Jean-Marie Roman and Jean-Marie Dubois. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Philippe Plaindoux stands out as an influential inventor in the realm of metallic finishes. His innovative approaches and patented methods continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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