Louvain-la-Neuve, Belgium

Philippe Edouard Jean Eliaers

This inventor holds 1 USPTO granted patent. Top assignees: Friesland Brands B.v., Universitè Catholique De Louvain. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Philippe Edouard Jean Eliaers. Retrieved from https://idiyas.com/inventor/philippe-edouard-jean-eliaers

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Philippe Edouard Jean Eliaers: Innovator in Powder Treatment Technology

Introduction

Philippe Edouard Jean Eliaers is a notable inventor based in Louvain-la-Neuve, Belgium. He has made significant contributions to the field of powder treatment technology, particularly with his innovative designs and methods.

Latest Patents

Eliaers holds 1 patent for his invention titled "Vortex chamber device, and method for treating powder particles or a powder particles precursor." This invention features a vortex chamber device that provides an effective method for treating powder particles or their precursors.

Career Highlights

Throughout his career, Philippe Edouard Jean Eliaers has worked with esteemed organizations, including Université Catholique De Louvain and Friesland Brands B.V. His work in these institutions has allowed him to develop and refine his innovative ideas.

Collaborations

Eliaers has collaborated with notable individuals in his field, including Albert Thijs Poortinga and Juray De Wilde. These partnerships have contributed to the advancement of his research and inventions.

Conclusion

Philippe Edouard Jean Eliaers is a distinguished inventor whose work in powder treatment technology has made a lasting impact. His innovative vortex chamber device exemplifies his commitment to advancing this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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