East Douglas, MA, United States of America

Philip W Cenedella


Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 1993-1996

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5 patents (USPTO):Explore Patents

Title: The Innovations of Philip W. Cenedella

Introduction

Philip W. Cenedella is a notable inventor based in East Douglas, MA (US). He has made significant contributions to the field of media handling technology, holding a total of 5 patents. His work has been instrumental in advancing the efficiency and functionality of photoplotting structures.

Latest Patents

One of his latest patents is titled "System for handling curved form media and cassette therefor." This innovative media handling unit is a self-contained device capable of being moved to existing photoplotting structures. It transports media sheets from a supply cassette housed within the unit and advances them into the plotter for conducting a plotting operation. The unit also retrieves the scanned media from the photoplotter, returning it to the unit in a light-tight environment where the scanned film is deposited onto a collecting tray. The supply of film is provided in a cassette with a semi-cylindrical support surface, causing the film to take on a preformed configuration that is generally coincident with the shape of the support surface on the plotter.

Career Highlights

Throughout his career, Philip has worked with several prominent companies, including Gerber Garment Technology, Inc. and Gerber Systems Corporation. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects.

Collaborations

Philip has collaborated with notable coworkers such as Richard Kuchta and Lawrence S. Wolfson. These partnerships have further enriched his work and led to the development of groundbreaking technologies.

Conclusion

Philip W. Cenedella's contributions to media handling technology exemplify the spirit of innovation. His patents and career achievements reflect a commitment to advancing the field and improving the efficiency of photoplotting processes.

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