Company Filing History:
Years Active: 2020
Title: Philip Rothhardt: Innovator in Semiconductor Technology
Introduction
Philip Rothhardt is a notable inventor based in Freiburg, Germany. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods for doping semiconductor substrates.
Latest Patents
Rothhardt holds a patent titled "Method for doping semiconductor substrates by means of a co-diffusion process and doped semiconductor substrate produced by means of said method." This invention relates to a method for doping semiconductor substrates using a co-diffusion process. In this process, semiconductor substrates are coated on at least one side with a layer containing at least one first dopant. Two of these coated substrates are then arranged in a process chamber so that their coated sides are brought into direct contact. He has 1 patent to his name.
Career Highlights
Philip Rothhardt is associated with the Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung E.V., a leading research organization in Germany. His work has been instrumental in advancing semiconductor technologies, which are crucial for various electronic applications.
Collaborations
Rothhardt has collaborated with notable colleagues such as Andreas Wolf and Sebastian Meier, contributing to the collective expertise in their research endeavors.
Conclusion
Philip Rothhardt's innovative work in semiconductor doping processes showcases his commitment to advancing technology in this critical field. His contributions continue to influence the development of semiconductor applications.