Company Filing History:
Years Active: 2001-2009
Title: Innovations of Philip J Ring
Introduction
Philip J Ring is a notable inventor based in Beverly, MA (US), recognized for his contributions to the field of semiconductor processing. He holds a total of 4 patents, showcasing his innovative approach to improving ion implantation technologies.
Latest Patents
Among his latest patents is a "Deposition reduction system for an ion implanter." This system is designed to control the temperature of a semiconductor workpiece processing tool and its surrounding structure, effectively reducing deposition rates within an ion implanter. Another significant patent is the "Ion implanter with contaminant collecting surface." This invention features an ion source that generates an ion beam, which intersects a workpiece, such as a silicon wafer, for ion implantation. The design includes a liner with grooves that capture contaminants generated during the operation of the ion implanter.
Career Highlights
Philip J Ring is currently employed at Axcelis Technologies, Inc., where he continues to develop innovative solutions in the semiconductor industry. His work has significantly advanced the efficiency and effectiveness of ion implantation processes.
Collaborations
Throughout his career, Philip has collaborated with esteemed colleagues, including Alexander S Perel and Jiong Chen, contributing to various projects that enhance semiconductor technology.
Conclusion
Philip J Ring's innovative patents and contributions to the field of ion implantation reflect his commitment to advancing semiconductor processing technologies. His work continues to influence the industry positively.