Philip Hammar

Title: The Innovative Contributions of Philip Hammar

Introduction

Philip Hammar is a notable inventor based in Chevy Chase, MD (US). He has made significant contributions to the field of plasma ashing processes, particularly in enhancing the efficiency of photoresist removal. His work is crucial for advancements in semiconductor manufacturing and related technologies.

Latest Patents

Hammar holds a patent for an "Apparatus and plasma ashing process for increasing photoresist removal rate." This innovative process involves removing photoresist material and post-etch residues from substrates that comprise carbon, hydrogen, or a combination of both. The process utilizes a plasma formed from an essentially oxygen-free and nitrogen-free gas mixture, which is introduced into a specially designed process chamber. This chamber includes a baffle plate assembly that facilitates the effective removal of unwanted materials while periodically cleaning the chamber with an oxygen plasma.

Career Highlights

Philip Hammar is currently associated with Axcelis Technologies, Inc., where he continues to develop and refine technologies that impact the semiconductor industry. His expertise in plasma ashing processes has positioned him as a valuable asset in his field.

Collaborations

Hammar has collaborated with notable colleagues, including Alan Frederick Becknell and David Ferris. These partnerships have contributed to the advancement of innovative solutions in the industry.

Conclusion

Philip Hammar's contributions to the field of plasma ashing processes exemplify the importance of innovation in technology. His patent and ongoing work at Axcelis Technologies, Inc. highlight his role in shaping the future of semiconductor manufacturing.