Madison Heights, MI, United States of America

Philip H Sheridan


Average Co-Inventor Count = 3.6

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 1993-1995

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Philip H. Sheridan

Introduction

Philip H. Sheridan is a notable inventor based in Madison Heights, MI (US). He has made significant contributions to the field of chemical vapor deposition and has been awarded a total of 3 patents. His work focuses on advanced materials and processes that have implications in various technological applications.

Latest Patents

One of Sheridan's latest patents is titled "Chemical vapor deposition of metal pnictogenide films using single." This innovative process involves providing a single source of a metal pnictogenide and heating it to a temperature sufficient to sublime the source at a pressure ranging from about 0.0001 to 760 torr. This allows for the delivery of a sublimate into a reaction zone, where a substrate is heated to approximately 200°C to 800°C. The sublimate is then passed through this reaction zone and over the substrate, resulting in the deposition of a thin film of metal pnictogenide. Another significant patent is related to "Metallo-organic precursors to titanium nitride." In this process, a titanium tetrahalide is reacted with a primary alkyl or aryl amine to prepare a metallo-organic precursor. This precursor can be volatilized to form a gaseous chemical vapor deposition precursor to titanium nitride or pyrolyzed to create bulk titanium nitride.

Career Highlights

Throughout his career, Philip H. Sheridan has worked with prominent organizations, including Ford Motor Company and Wayne State University. His experience in these institutions has allowed him to develop and refine his innovative techniques in material science.

Collaborations

Sheridan has collaborated with notable colleagues such as Charles H. Winter and Tilak S. Lewkebandara. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Philip H. Sheridan's contributions to the field of chemical vapor deposition and material science are noteworthy. His innovative patents and collaborations reflect his commitment to advancing technology and enhancing material applications.

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