Ford Motor Company Limited

Wayne State University

Philip H Sheridan

Charles H Winter

James W Proscia

Tilak S Lewkebandara

T Suren Lewkebandara

A process for depositing a film of metal pnictogenide. The process comprises providing a single source of a metal pnictogenide and heating said source to a temperature sufficient to sublime the single source at a pressure selected from a range of about 0.0001 to 760 torr so that a sublimate is delivered into a reaction zone. Within this reaction zone, a substrate is provided upon which deposition may occur. The reaction zone is heated to approximately 200.degree.-800.degree. C. The sublimate is passed through this reaction zone and over the substrate to produce a thin film of metal pnictogenide which is deposited upon the substrate.

Chemical vapor deposition of metal pnictogenide films using single

A titanium tetrahalide is reacted with a primary alkyl or aryl amine to prepare a metallo-organic precursor, which thereafter may be volatilized to form a gaseous chemical vapor deposition precursor to titanium nitride, or may be pyrolyzed to form bulk titanium nitride.

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Madison Heights, MI, United States of America

Philip H Sheridan