Columbus, OH, United States of America

Philip G Vais

This inventor holds 3 USPTO granted patents. Top assignee: Kb Alloys. Active years: 2000.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2000

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3 patents (USPTO):Explore Patents

Title: The Innovations of Philip G Vais

Introduction

Philip G Vais is a notable inventor based in Columbus, OH, who has made significant contributions to the field of materials science. With a total of three patents to his name, he has focused on developing advanced master alloys that enhance the properties of nonferrous materials. His work is particularly relevant in industries that require high-performance materials.

Latest Patents

Among his latest patents is the "Strontium master alloy composition having a reduced solidus temperature." This innovative master alloy comprises 20-80% strontium, with a preferred range of 0.01-2.0% of aluminum and/or copper, while the balance consists primarily of zinc along with impurities. The patent also details a method for preparing this alloy and a technique for modifying the microstructure of nonferrous alloys using the master alloy.

Career Highlights

Philip G Vais is currently associated with Kb Alloys, where he continues to push the boundaries of material innovation. His expertise in alloy compositions has positioned him as a key player in the development of advanced materials that meet the demands of modern engineering applications.

Collaborations

Throughout his career, Philip has collaborated with notable colleagues, including Gary W Boone and Daniel B Franklin. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Philip G Vais exemplifies the spirit of innovation in materials science through his patents and collaborations. His work on strontium master alloys is paving the way for advancements in nonferrous materials, showcasing the importance of research and development in this field.

Profile summary based on public USPTO records.
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