Espoo, Finland

Petteri Halme

This inventor holds 1 USPTO granted patent. Top assignee: Valmet Technologies Oy. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Petteri Halme. Retrieved from https://idiyas.com/inventor/petteri-halme-63lhpm7m

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Petteri Halme: Innovator in Press Belt Technology

Introduction

Petteri Halme is a notable inventor based in Espoo, Finland. He has made significant contributions to the field of manufacturing technology, particularly in the development of press belts used in various industrial applications.

Latest Patents

Halme holds a patent for a "Press belt, an arrangement in a long nip and a method of manufacturing a press belt." This invention pertains to a press belt designed for a shoe press. The press belt is an endless loop made of elastomeric material, featuring an outer surface equipped with several grooves to facilitate water removal. Notably, the depths of adjacent drain grooves on the outer surface change constantly, enhancing the belt's functionality.

Career Highlights

Petteri Halme is associated with Valmet Technologies Oy, a company known for its innovative solutions in the manufacturing sector. His work has contributed to advancements in press technology, showcasing his expertise and commitment to innovation.

Collaborations

Halme has collaborated with notable colleagues, including Jari Jännetyinen and Jori Onnela, further enriching his professional experience and contributions to the field.

Conclusion

Petteri Halme's innovative work in press belt technology exemplifies his dedication to advancing manufacturing processes. His patent and collaborations highlight his role as a key figure in this specialized area of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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