Drunen, Netherlands

Petrus W H Schalk

This inventor holds 1 USPTO granted patent. Top assignee: Berg Technology, Inc.. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Petrus W H Schalk. Retrieved from https://idiyas.com/inventor/petrus-w-h-schalk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Petrus W H Schalk

Introduction

Petrus W H Schalk is a notable inventor based in Drunen, Netherlands. He has made significant contributions to the field of contact terminal manufacturing. His innovative approach has led to the development of a unique method that enhances the quality and efficiency of contact terminals.

Latest Patents

Petrus holds a patent for a "Method of making smooth contact terminals." This invention involves a detailed process for producing a contact terminal with a first contact surface designed for optimal interaction with a mating contact area. The method includes several steps: stamping the contact terminal from a blank piece with a flat surface, pressing the contact surface against a polished support tool, and applying a predetermined force to deform and polish the contact surface.

Career Highlights

Petrus is currently associated with Berg Technology, Inc., where he applies his expertise in the development of advanced manufacturing techniques. His work has been instrumental in improving the performance and reliability of contact terminals used in various applications.

Collaborations

Petrus collaborates with Niranjan Kumar Mitra, contributing to innovative projects that push the boundaries of technology in their field.

Conclusion

Petrus W H Schalk's contributions to the invention of contact terminals demonstrate his commitment to innovation and excellence in engineering. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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