Peter W Freeman

Title: Innovations of Peter W Freeman

Introduction

Peter W Freeman is a notable inventor based in Austin, TX (US). He has made significant contributions to the field of photoresist technology, particularly through his innovative methods for treating photoresists. His work has implications in various industries, including semiconductor manufacturing.

Latest Patents

Peter W Freeman holds 1 patent for his invention titled "Methods for treating photoresists." This patent describes methods for treating photoresists and forming photoresist relief images. The invention includes a method that involves providing a photoresist coating with a crosslinked surface layer, treating the coating with an organometallic material, and developing the coating to create a relief image that contains an etch-resistant effective amount of the organometallic material.

Career Highlights

Throughout his career, Peter has worked with prominent companies such as Shipley Company LLC and Digital Equipment Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in photoresist technology.

Collaborations

Peter has collaborated with notable professionals in his field, including Edward K Pavelchek and John F Bohland. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Peter W Freeman's contributions to the field of photoresist technology demonstrate his innovative spirit and dedication to advancing the industry. His patent and career achievements reflect his significant role as an inventor.