The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 1994
Filed:
Sep. 21, 1992
Applicant:
Inventors:
Edward K Pavelchek, Waltham, MA (US);
Peter W Freeman, Austin, TX (US);
John F Bohland, Berlin, MA (US);
Susan K Jones, Raleigh, NC (US);
Bruce W Dudley, Durham, NC (US);
Assignees:
Shipley Company, Inc., Marlborough, MA (US);
Digital Equipment Corporation, Maynard, MA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ; G03F / ;
U.S. Cl.
CPC ...
430326 ; 430313 ; 430315 ; 430323 ; 430324 ; 430325 ; 430329 ; 156628 ; 156643 ;
Abstract
The present invention comprises methods for treating photoresists and forming photoresist relief images, including a method comprising providing a photoresist coating having a crosslinked surface layer, treating the photoresist coating with an organometallic material, and developing the photoresist coating to provide a relief image comprising an etch resistant effective amount of organometallic material.