Peter Nikolsky

Title: Innovations by Peter Nikolsky

Introduction

Peter Nikolsky is an accomplished inventor based in Veldhoven, Netherlands. He has made significant contributions to the field of circuit pattern separation, which is crucial for the advancement of semiconductor technology. His innovative approach has led to the development of a unique method that enhances the quality of circuit patterns printed on wafers.

Latest Patents

Peter Nikolsky holds a patent for an "Apparatus and method for separating a circuit pattern into multiple circuit patterns." This patent describes a method for separating an original circuit pattern to be printed on a wafer into multiple circuit patterns. The process involves simulating to obtain an image log-slope (ILS), normalized image log-slope (NILS), or any other characteristic of image quality on the edges of polygons in the circuit pattern. The method identifies properly printed edges and not-properly printed edges based on the ILS level criterion. Ultimately, the original circuit pattern is separated into multiple patterns, ensuring that each does not contain any not-properly printed edges. This innovation is vital for improving the reliability and performance of semiconductor devices.

Career Highlights

Peter Nikolsky is associated with ASML Masktools B.V., a leading company in the semiconductor industry. His work at ASML Masktools B.V. has allowed him to apply his expertise in circuit pattern technology, contributing to the company's reputation for excellence in photolithography equipment.

Collaborations

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Conclusion

Peter Nikolsky's innovative methods in circuit pattern separation demonstrate his significant impact on the semiconductor industry. His patent reflects a commitment to enhancing the quality and reliability of circuit patterns, which is essential for the advancement of technology.