Sunnyvale, CA, United States of America

Peter McKeever

This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2001.


% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 32(Granted Patents)


Company Filing History:


Years Active: 2001

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2 patents (USPTO):Explore Patents

Title: The Innovations of Peter McKeever

Introduction

Peter McKeever is an accomplished inventor based in Sunnyvale, CA. He has made significant contributions to the field of technology, particularly in the area of semiconductor manufacturing. With a total of 2 patents to his name, McKeever's work has had a notable impact on the industry.

Latest Patents

One of McKeever's latest patents is titled "Method of post CMP defect stability improvement." This invention provides a method and apparatus for delivering one or more rinse agents to a surface, such as a polishing pad surface, and preferably one or more polishing fluids. The invention also outlines a method of cleaning surfaces, including a polishing pad surface and a substrate surface, by delivering a spray of rinse agents to the surface. This process ensures that the rinse agent flows across the surface from a central region to an outer region, where unwanted debris and material are collected.

Career Highlights

Peter McKeever is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to develop innovative solutions that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, McKeever has collaborated with notable colleagues, including Thomas H Osterheld and Chad Garretson. These collaborations have contributed to the advancement of technology in their respective fields.

Conclusion

Peter McKeever's contributions to the field of semiconductor manufacturing through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor. His innovative methods continue to shape the industry and improve manufacturing processes.

Profile summary based on public USPTO records.
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